● Introduction
The PBN/PG heater is a kind of high purity product produced by CVD process. PBN, PG is inert in the corrosive gases atmosphere. It releases little gas at a great heat because of high-purity. Due to its good thermal shock resistance, the PBN/PG heater can be used at the temperature higher than1500 degrees in some cases. The heating surface has good thermal uniformity for that PG is surface heating and PBN material has good thermal conductivity.
● Characteristic
1. Surface heating and good temperature distribution.
2. Not affected by magnetic field
3. High-purity, It releases little gas at a great heat.
4. It can be adapted for contact heating.
5. High heating rate.
6. Long service life
7. Good corrosion resistance of acid, alkali and organic solvent.
● Parameter
shape(mm) | size(mm) | Resistance(Ω) | voltage | current | power(W) |
Circular (Electricity flows as a ring) | 25.4 | 10-16 | 40 | 8 | 300 |
38.1 | 10-16 | 70 | 10 | 700 | |
50.8 | 15-25 | 110 | 15 | 1300 | |
63.5 | 22-35 | 180 | 15 | 2000 | |
76.2 | 22-35 | 208 | 20 | 3000 | |
Circular (Electricity flows as a strip-type) | 50.8 | 15-25 | 110 | 12 | 1300 |
76.2 | 15-25 | 170 | 20 | 3000 | |
101.6 | 15-25 | 208 | 25 | 4500 | |
square | 35.2*25 | 7.4-10.1 | 35 | 8 | 220 |
59.8*50 | 11.1-15.3 | 110 | 16 | 1440 | |
93.4*75 | 16.1-22.2 | 170 | 17 | 2300 |
● Application:
Mainly used in rapid annealing furnaces, sputter coating plants, heating devices of an electron microscope, metal evaporator. And it can also used in molecular beam epitaxy equipments used for producing Gallium arsenide epitaxial wafer.